XTL-20 Reflective Metallographic Microscope

 Instrument Introduction:

●Clear, sharp, and high contrast microscopic images can be obtained using various observation methods. The attachments are complete and the configuration is complete, allowing for flexible system combination and functional expansion. Ergonomic design with a solid and reliable system structure.

●This cost-effective microscope is capable of inspecting various devices and wafers. The focusing mechanism and the illumination intensity control device are closely adjacent to each other and can be operated with the same hand. Specially suitable for small and medium-sized semiconductor FPD inspection, circuit board slicing measurement, in line with industry standards, enhancing safety and reliability.

●The ultra cost-effective bright field optical system adopts infinite high beam path technology, integrating multiple observation methods such as bright field, oblique illumination, polarization, etc. It can present clear and sharp microscopic images under any observation, and can be selected according to practical applications. It is an effective tool for industrial inspection.

Instrument features:

●High definition mirror, no blurred edges in the field of view, full field of view high-definition

●Light field compensation can remove reflective exposure points in the mirror image

●Novel appearance, lead-free and environmentally friendly material for the whole machine

●Translucent and reflective dual light sources, capable of observing transparent or non transparent samples perfectly, achieving multi-functional functionality in one machine

●Paired with the original imaging system, it can achieve a perfect mirror screen display effec

Instrument parameters: